last modified：2025/06/18
Associate Professor Yoshimoto Kenji
Faculty, Affiliation
Advanced Manufacturing Technology Institute Digital Twin Group
Associate Professor
College and School Educational Field
Division of Frontier Engineering, Graduate School of Natural Science and Technology
Division of Natural System, Graduate School of Natural Science and Technology
School of Frontier Engineering, College of Science and Engineering
Laboratory
Chemical Process Engineering Lab, Division of Frontier Engineering, Graduate School of Natural Science and Technology
Academic Background
【Academic background(Doctoral/Master's Degree)】
University of Wisconsin - Madison Graduate School of Engineering Department of Chemical Engineering 2005 Completed
【Degree】
Ph.D
Career
Kanazawa University Advanced Manufacturing Technology Institute Associate Professor(2024-)
Toray Industries, Inc. Advanced Materials Laboratories Senior Research Associate(2022-2023)
Research Association of High-Throughput Design and Development for Advanced Functional Materials (ADMAT) Research Associate(2020-2022)
Toray Industries, Inc. Advanced Materials Laboratories Research Associate(2019-2020)
Kyoto University Center for the Promotion of Interdisciplinary Education and Research Program-Specific Associate Professor(2012-2019)
GlobalFoundries Member of Technical Staff(2009-2012)
Advanced Micro Devices Senior Research Engineer(2008-2009)
Year & Month of Birth
Academic Society
The Society of Photopolymer Science and Technology
The Japan Society of Applied Physics
SPIE
The Society of Chemical Enginnering, Japan
The Society of Polymer Science, Japan
Award
○Photopolymer Science and Technology Best Paper Award(2017)
Specialities
Biological physics/Chemical physics/Soft matter physics
Speciality Keywords
Research Themes
Research and development of Directed Self-Assembly (DSA) for the generation of next-generation lithography technology
Digital design of innovative polymer separation membranes
Books
- Chi-chun Liu,Kenji Yoshimoto,Juan de Pablo,Paul Nealey Microlithography: Science and Technology, 3rd Ed. (B. Smith & K. Suzuki Eds.) CRC Press 2020/05
- Kenji Yoshimoto Self-Assembly in Blockcopolymers: Structural Control and Applications CMC Publisher 2018/10
Papers
- Effective pitch reduction of self-assembled lamellae by the use of (PS-b-PMMA)n multiblock copolymers Kenji Yoshimoto,Takashi Taniguchi Japanese Journal of Applied Physics 64 02SP05 2025/02/03
- Bottom-up Multiscale Simulation of Nonlinear Rheology for Entangled Polymer Melts: Using Atactic Polystyrene as An Example Heyi Liang,Kenji Yoshimoto,Stuart J. Rowan,Juan J. de Pablo Macromolecules 57 24 11808 2024/12/04
- Recent developments on multiscale simulations for rheology and complex flow of polymers Takeshi Sato,Kenji Yoshimoto Korea-Australia Rheology Journal 36 4 253 2024/10/24
- Multiscale rheology model for entangled Nylon 6 melts Heyi Liang,Kenji Yoshimoto,Masahiro Kitabata,Umi Yamamoto,Juan J. de Pablo Journal of Polymer Science 60 22 3071 2022/10/07
- Control of the Cell Structure of UV-Induced Chemically Blown Nanocellular Foams by Self-Assembled Block Copolymer Morphology Podchara Rattanakawin,Kenji Yoshimoto,Yuta Hikima,Shinsuke Nagamine,Yuhan Jiang,Masatoshi Tosaka,Shigeru Yamago,Masahiro Ohshima Macromolecules 55 12 5176 2022/06/28
- Bottom-Up Multiscale Approach to Estimate Viscoelastic Properties of Entangled Polymer Melts with High Glass Transition Temperature Heyi Liang,Kenji Yoshimoto,Phwey Gil,Masahiro Kitabata,Umi Yamamoto,Juan J. de Pablo Macromolecules 55 8 3159 2022/04/05
- Viscoelastic phase separation model for ternary polymer solutions Kenji Yoshimoto,Takashi Taniguchi The Journal of Chemical Physics 154 10 2021/03/11
- Highly Ordered Nanocellular Polymeric Foams Generated by UV-Induced Chemical Foaming Podchara Rattanakawin,Kenji Yoshimoto,Yuta Hikima,Alvin Chandra,Teruaki Hayakawa,Masatoshi Tosaka,Shigeru Yamago,Masahiro Ohshima ACS Macro Letters 9 10 1433 2020/10/20
- Development and Optimization of UV-Induced Chemical Foaming Process Podchara Rattanakawin,Kai Yamamura,Kenji Yoshimoto,Masahiro Ohshima Journal of Photopolymer Science and Technology 32 5 693 2019/06/24
- Toward Realization of Next-Genration Patterning with Directed Self-Assembly Kenji Yoshimoto Polymers 67 9 523 2018/09/01
- Synthesis of Photocleavable Block Copolymers for UV Induced Foaming Podchara Rattanakawin,Weijia Fan,Shigeru Yamago,Kenji Yoshimoto,Masahiro Ohshima Journal of Photopolymer Science and Technology 31 5 647 2018/06/25
- Direct Self-Assembly for Non-Periodic Designs Kenji Yoshimoto,Akihisa Yoshida,Masahiro Ohshima,Katsuyoshi Kodera,Yoshihiro Naka,Hideki Kanai,Sachiko Kobayashi,Simon Maeda,Phubes Jiravanichsakul,Katsutoshi Kobayashi,Hisako Aoyama Journal of Photopolymer Science and Technology 29 5 709 2016/06
- Effect of wall potential on morphology of symmetric diblock copolymers in nanotrench Akihisa Yoshida,Kenji Yoshimoto,Masahiro Ohshima Japanese Journal of Applied Physics 55 6S1 06GE01 2016/04/13
- Control of morphological defects at the boundary between the periodic and non-periodic patterns in directed self-assembly process Akihisa Yoshida,Kenji Yoshimoto,Masahiro Ohshima,Katsuyoshi Kodera,Yoshihiro Naka,Hideki Kanai,Sachiko Kobayashi,Simon Maeda,Phubes Jiravanichsakul,Katsutoshi Kobayashi,Hisako Aoyama ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES VIII 9777 97771O 2016/03
- Effects of thermal fluctuations and block copolymers compositions on defects in directed self-assembly hole shrink process Ken Fukawatase,Kenji Yoshimoto,Masahiro Ohshima JAPANESE JOURNAL OF APPLIED PHYSICS 54 6 06FE01 2015/06
- Optimization of directed self-assembly hole shrink process with simplified model Kenji Yoshimoto,Ken Fukawatase,Masahiro Ohshima,Yoshihiro Naka,Shimon Maeda,Satoshi Tanaka,Seiji Morita,Hisako Aoyama,Shoji Mimotogi JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS 13 3 031305 2014/07
- DFM for Defect-Free DSA Hole Shrink Process Ken Fukawatase,Kenji Yoshimoto,Masahiro Ohshima,Yoshihiro Naka,Shimon Maeda,Satoshi Tanaka,Seiji Morita,Hisako Aoyama,Shoji Mimotogi ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES VI 9049 90491 2014/03
- Multi-Scale DSA Simulations For Efficient Hotspot Analysis Yoshihiro Hori,Kenji Yoshimoto,Takashi Taniguchi,Masahiro Ohshima ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES VI 9049 90492L 2014/03
- Large-Scale Dynamics of Directed Self-Assembly Defects on Chemically Pre-Patterned Surface Kenji Yoshimoto,Takashi Taniguchi ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES V 8680 86801 2013
- Large-Scale Simulations of Directed Self-Assembly with Simplified Model Kenji Yoshimoto,Takashi Taniguchi Journal of Photopolymer Science and Technology 26 6 809 2013/06
- Exploration of the directed self-assembly based nano-fabrication design space using computational simulations Azat Latypov,Moshe Preil,Gerard Schmid,Ji Xu,He Yi,Kenji Yoshimoto,Yi Zou Proceedings of SPIE - The International Society for Optical Engineering 8680 868013 2013/03
- Scalable Simulations for Directed Self-Assembly Patterning with the use of GPU Parallel Computing Kenji Yoshimoto,Brandon L. Peters,Gurdaman S. Khaira,Juan J. de Pablo ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES IV 8323 83232 2012/03
- New Methodology to Predict Pattern Collapse for 14nm and Beyond Aasutosh Dave,Kenji Yoshimoto,John Sturtevant OPTICAL MICROLITHOGRAPHY XXV, PTS 1AND 2 8326 83261 2012/03
- Fundamental Investigation of Negative Tone Development (NTD) for the 22nm node (and beyond) Guillaume Landie,Yongan Xu,Sean Burns,Kenji Yoshimoto,Martin Burkhardt,Larry Zhuang,Karen Petrillo,Jason Meiring,Dario Goldfarb,Martin Glodde,Anthony Scaduto,Matthew Colburn,Jason Desisto,Young Bae,Michael Reilly,Cecily Andes,Vaishali Vohra ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXVIII 7972 797206 2011/03
- Revisit Pattern Collapse for 14nm Node and Beyond Kenji Yoshimoto,Craig Higgins,Ananthan Raghunathan,John G. Hartley,Dario L. Goldfarb,Hirokazu Kato,Karen Petrillo,Matthew E. Colburn,Jeffrey Schefske,Obert Wood,Thomas I. Wallow ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXVIII 7972 79720 2011/03
- Hexameric Helicase Deconstructed: Interplay of Conformational Changes and Substrate Coupling Kenji Yoshimoto,Karunesh Arora,Charles L. Brooks BIOPHYSICAL JOURNAL 98 8 1449 2010/04
- CDSEM Focus/Dose Monitor for Product Applications Chas Archie,Eric Solecky,Pawan Rawat,Tim Brunner,Kenji Yoshimoto,Roger Cornell,Ofer Adan METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXIV 7638 763804 2010/03
- Considerations in Source-Mask Optimization for Logic Applications Yunfei Deng,Yi Zou,Kenji Yoshimoto,Yuansheng Ma,Cyrus E. Tabery,Jongwook Kye,Luigi Capodieci,Harry J. Levinson OPTICAL MICROLITHOGRAPHY XXIII 7640 76401J 2010/03
- Inverse vs. traditional OPC for the 22nm node James Word,Yuri Granik,Marina Medvedeva,Sergei Rodin,Luigi Capodieci,Yunfei Deng,Jongwook Kye,Cyrus Tabery,Kenji Yoshimoto,Yi Zou,Hesham Diab,Mohamed Gheith,Mohamed Habib,Cynthia Zhu SPIE Proceedings 7274 72743A 2009/03/13
- Calibrating OPC model with full CD profile data for 2D and 3D patterns using scatterometry A. D. Dave,O. Kritsun,Y. Deng,K. Yoshimoto,J. Li,J. Hu Proc. SPIE 7274 727415 2009/03
- Correlation of Experimental and Simulated Cure-Induced Photoresist Distortions in Double Patterning Thomas I. Wallow,Mahidhar Rayasam,Masanori Yamaguchi,Yohei Yamada,Karen Petrillo,Kenji Yoshimoto,Jongwook Kye,Ryoung-han Kim,Harry J. Levinson ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXVI 7273 727309 2009/03
- Mechanical properties of polymer nanostructures: measurements based on deformation in response to capillary forces Mark P Stoykovich,Kenji Yoshimoto,Paul F Nealey APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING 90 2 277 2008/02
- Influence of confinement on the fragility of antiplasticized and pure polymer films Robert A. Riggleman,Kenji Yoshimoto,Jack F. Douglas,Juan J. de Pablo PHYSICAL REVIEW LETTERS 97 4 045502 2006/07
- Local mechanical properties of polymeric nanocomposites George J Papakonstantopoulos,Kenji Yoshimoto,Manolis Doxastakis,Paul F Nealey,Juan J de Pablo PHYSICAL REVIEW E 72 3 31801 2005/09
- Isothermal stress and elasticity tensors for ions and point dipoles using Ewald summations Kevin Van Workum,Kenji Yoshimoto,Juan J de Pablo,Jack F Douglas PHYSICAL REVIEW E 71 6 61102 2005/06
- Statistical calculation of elastic moduli for atomistic models Kenji Yoshimoto,George J Papakonstantopoulos,James F Lutsko,Juan J de Pablo PHYSICAL REVIEW B 71 18 184108 2005/05
- Local dynamic mechanical properties in model free-standing polymer thin films Kenji Yoshimoto,Tushar S Jain,Paul F Nealey,Juan J de Pablo JOURNAL OF CHEMICAL PHYSICS 122 14 1 2005/04
- Mechanical heterogeneities in model polymer glasses at small length scales Kenji Yoshimoto,Tushar S Jain,Kevin V Workum,Paul F Nealey,Juan J de Pablo PHYSICAL REVIEW LETTERS 93 17 1 2004/10
- A two-dimensional model of the deformation of photoresist structures using elastoplastic polymer properties Kenji Yoshimoto,Mark P Stoykovich,Heidi B Cao,Juan J de Pablo,Paul F Nealey,Walt J Drugan JOURNAL OF APPLIED PHYSICS 96 4 1857 2004/08
- The use of surfactant in the rinse to improve collapse behavior of chemically amplified photoresists Ivan Junarsa,Mark P Stoykovich,Kenji Yoshimoto,Paul F Nealey ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XXI, PTS 1 AND 2 5376 842 2004
- Deformation of nanoscopic polymer structures in response to well-defined capillary forces Mark P Stoykovich,Heidi B Cao,Kenji Yoshimoto,Leonidas E Ocola,Paul F Nealey ADVANCED MATERIALS 15 14 1180 2003/07
Conference Presentations
Others
- Entanglement Molecular Weight of Polymer Melts Estimated from Large-scale Atomistic Molecular Dynamics Simulations Kenji Yoshimoto HPCI User Report 2022/11
- Large-scale simulations of polymer separation membranes Kenji Yoshimoto Academic Center for Computing and Media Studies, Kyoto University 17 1 49 2018/12
- Toward Realization of Next-Genration Patterning with Directed Self-Assembly Kenji Yoshimoto Polymers 67 9 523 2018/09/01
- Large-Scale Simulations for Polymer Phase Separation Kenji Yoshimoto 2017 58 2017/03
- Large-scale simulations of block copolymer self-assembly in thin film Kenji Yoshimoto Academic Center for Computing and Media Studies, Kyoto University 13 2 4 2015/02
- Department of Chemical Engineering at the University of Wisconsin-Madison : Advanced Nanolithography Research of Prof. Nealey and Prof. de Pablo YOSHIMOTO Kenji Journal of the Japan Society of Polymer Processing 15 5 347 2003/05/20
Arts and Fieldwork
Patent
Theme to the desired joint research
Grant-in-Aid for Scientific Research
○「伸長流動下での非溶媒誘起相分離」(2024-2025)
Competitive research funding,Contribution
Collaborative research,Consignment study
Classes (Bachelors)
○Material Simulation B(2024)
○Introduction to Advanced Technologies A(2024)
○Material Simulation A(2024)
○Practical Exercise of Material Process(2024)
Classes (Graduate Schools)
○Advanced Chemical Process Engineering A(2024)
○Advanced Chemical Process Engineering B(2024)